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本書内で参照されている浸出テストとこれに関連する要求条件は，静的な状態での数値を提供する。
SEMI F29-0997 (Reapproved 0517)
1 — Specification for SECS-II Protocol for Object Services (OSS)
SEMI C28 — Specifications for Hydrofluoric Acid
This Standard can be applied to single wafer equipment as well as batch equipment
M05800 - SEMI M58 - Test Method for Evaluating DMA Based Particle Deposition Systems and Processes StdPbc-0819 本書内で参照されている浸出テストとこれに関連する要求条件は，静的な状態での数値を提供する。1 Purpose 1. 1 SEMI M52 requires the use of certified reference materials (CRMs) for calibration of scanning surface inspection systems (SSISs). The calibration method is defined in SEMI M53. This Test Method provides the procedure to determine whether a specific particle deposition system, using a differential mobility analyzer (DMA), can produce the required CRMs. 1. 2 Both organizations producing depositions internally for in house use and
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